A new dual-target dual-laser vaporization source for the production of bina
ry metallic clusters is presented. Clusters of the type AunXm (X=Al, Fe, Co
, Ni) were produced. Excellent control over the mixing process was achieved
by varying the delay time between the firing of the two lasers and their e
nergy densities. Having identified these critical parameters, their influen
ce over the production process is shown in detail for the AunAlm system. Th
e production of bimetallic clusters in this source is due to the spatial an
d temporal overlap of the two laser vaporized materials in the source. (C)
2000 American Institute of Physics. [S0034-6748(00)00401-9].