Apparatus for temperature programmed desorption studies of thin films

Citation
Br. Chalamala et al., Apparatus for temperature programmed desorption studies of thin films, REV SCI INS, 71(1), 2000, pp. 320-321
Citations number
11
Categorie Soggetti
Spectroscopy /Instrumentation/Analytical Sciences","Instrumentation & Measurement
Journal title
REVIEW OF SCIENTIFIC INSTRUMENTS
ISSN journal
00346748 → ACNP
Volume
71
Issue
1
Year of publication
2000
Pages
320 - 321
Database
ISI
SICI code
0034-6748(200001)71:1<320:AFTPDS>2.0.ZU;2-8
Abstract
A versatile analytical system based on thermal desorption spectroscopy of t hin films is presented. We have found the apparatus to be a useful tool for measuring the desorption characteristics of trapped gases in physical vapo r deposited thin films and in determining the thermal stability of multi-co mponent thin film compounds and multilayer structures. The system was also found to be a convenient tool for determining outgassing properties of thin film and thick film materials for vacuum microelectronic device applicatio ns. (C) 2000 American Institute of Physics. [S0034-6748(00)02801-X].