A versatile analytical system based on thermal desorption spectroscopy of t
hin films is presented. We have found the apparatus to be a useful tool for
measuring the desorption characteristics of trapped gases in physical vapo
r deposited thin films and in determining the thermal stability of multi-co
mponent thin film compounds and multilayer structures. The system was also
found to be a convenient tool for determining outgassing properties of thin
film and thick film materials for vacuum microelectronic device applicatio
ns. (C) 2000 American Institute of Physics. [S0034-6748(00)02801-X].