Chemical and structural characterization of thin films using electrons andphotons

Citation
Aj. Hartmann et Rn. Lamb, Chemical and structural characterization of thin films using electrons andphotons, SURF INT AN, 29(1), 2000, pp. 3-11
Citations number
55
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
SURFACE AND INTERFACE ANALYSIS
ISSN journal
01422421 → ACNP
Volume
29
Issue
1
Year of publication
2000
Pages
3 - 11
Database
ISI
SICI code
0142-2421(200001)29:1<3:CASCOT>2.0.ZU;2-G
Abstract
This tutorial survey describes the application of selected photon- and elec tron-excited characterisation techniques for the analysis of thin films. Th e fundamentals of some techniques are discussed but the focus of this artic le is the link between the different techniques rather than a comprehensive discussion of them. Laboratory-based and synchrotron radiation techniques are compared for the characterization of long- and short-range structural o rder, as well as for chemical and electronic structural analysis. The pract ical application of the analytical procedures discussed is summarized in tw o case studies. Copyright (C) 2000 John Wiley & Sons, Ltd.