Based on the investigation of molecular dynamics simulation, a deposition d
ynamics model of incident atom in vapor phase deposition was established. T
he atomistic processes of Au/Au(100) epitaxial growth in the early stage we
re simulated by using kinetic Monte Carlo method and adatomic diffusion mod
el with local environment. The change of film growth mode with temperature
was investigated. We revealed that the monomer diffusion plays a very impor
tant role in the film growth. At the temperature as low as that at which th
e monomer cannot diffuse in large scale, adatom nucleation and island forma
tion depends on the increase of adatom density. With the increase of temper
ature, the film growth mode depends on the competition between in-plane dif
fusion and inter-layer diffusion of monomers.