Optimizing growth conditions for GaN/AlxGa1-xN multiple quantum well structures

Citation
Kc. Zeng et al., Optimizing growth conditions for GaN/AlxGa1-xN multiple quantum well structures, APPL PHYS L, 76(7), 2000, pp. 864-866
Citations number
12
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
76
Issue
7
Year of publication
2000
Pages
864 - 866
Database
ISI
SICI code
0003-6951(20000214)76:7<864:OGCFGM>2.0.ZU;2-D
Abstract
We have investigated the optimal growth conditions for GaN/AlxGa1-xN multip le quantum well (MQW) structures by metal organic chemical vapor deposition . Optical properties of a set of GaN/AlxGa1-xN MQW samples grown under syst ematically varied growth conditions have been studied by employing picoseco nd time-resolved photoluminescence (PL) spectroscopy. The PL emission effic iency, the linewidth of the PL emission spectra, the ratio of the barrier e mission intensity to the well emission intensity, and the temperature depen dence of the PL decay lifetime of these GaN/AlxGa1-xN MQW structures have b een measured and compared with each other carefully. Based on our studies, we concluded that the optimal growth conditions for GaN/AlxGa1-xN MQW struc tures are GaN-like rather than AlxGa1-xN-like or other conditions. The GaN/ AlxGa1-xN MQW structures grown under the GaN-like growth conditions exhibit ed higher quantum efficiencies and narrower PL emission linewidths than tho se grown under other conditions. PL emission from barrier regions was not o bserved in the MQW structures grown under the GaN-like growth conditions, w hich is highly preferred for ultraviolet light emitter applications. (C) 20 00 American Institute of Physics. [S0003-6951(00)04107-3].