Plasma CVD of ultrathin TiO2 films on powders in a circulating fluidized bed

Authors
Morstein, M Karches, M Bayer, C Casanova, D von Rohr, PR
Citation
M. Morstein et al., Plasma CVD of ultrathin TiO2 films on powders in a circulating fluidized bed, CHEM VAPOR, 6(1), 2000, pp. 16
Citations number
23
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
CHEMICAL VAPOR DEPOSITION
ISSN journal
09481907 → ACNP
Volume
6
Issue
1
Year of publication
2000
Database
ISI
SICI code
0948-1907(200002)6:1<16:PCOUTF>2.0.ZU;2-X
Abstract
Communication: A new, universal powder coating CVD process has been develop ed that combines a low-pressure circulating fluidized bed with a microwave or radiofrequency plasma to coat particles on a kilogram scale. This is ill ustrated by the CVD of dense titania coatings with a well-defined thickness of 10 nm or greater. The figure shows a ToF-SIMS image for the Ti in the t itania.