A way to higher resolution: spherical-aberration correction in a 200 kV transmission electron microscope

A double hexapole corrector system was constructed for compensation of the spherical aberration of the objective lens of a transmission electron micro scope. By implementing this system on a commercial 200 kV instrument with a field emission gun, the spherical aberration correction was demonstrated a nd an improvement of the point resolution from 0.24 to 0.13 nm was realized . Applying the new instrument to structure studies on Si/CoSi2 interfaces i t was demonstrated that an outstanding additional advantage of aberration c orrection is the substantially reduced contrast delocalization in high-reso lution images.