A series of GaN/In(x)Gal(1-x)N/GaN quantum well structures was investigated
by transmission electron microscopy (TEM) and photoluminescence spectrosco
py (PL). The structures were grown by metal organic chemical vapor depositi
on on Al2O3(0001) substrates varying only the substrate temperature between
800 and 860 degrees C for the InGaN growth under otherwise unaltered growt
h conditions. A strong shift of the PL emission wavelength from 390 to 480
nm is observed. Composition analyses were carried out by measuring local la
ttice parameters, which are directly related to the local In concentration,
from high-resolution TEM lattice finge images. An increase of the average
In concentration from 9% to 18% is found as the growth temperature is lower
ed. A laterally inhomogeneous In concentration is observed in all samples w
ith inclusions of high In content embedded in a quantum well with lower In
concentration indicating that phase separation occurs even at a low average
In concentration of 9%.