Nanobeam production with the multicusp ion source

Citation
Y. Lee et al., Nanobeam production with the multicusp ion source, REV SCI INS, 71(2), 2000, pp. 722-724
Citations number
4
Categorie Soggetti
Spectroscopy /Instrumentation/Analytical Sciences","Instrumentation & Measurement
Journal title
REVIEW OF SCIENTIFIC INSTRUMENTS
ISSN journal
00346748 → ACNP
Volume
71
Issue
2
Year of publication
2000
Part
2
Pages
722 - 724
Database
ISI
SICI code
0034-6748(200002)71:2<722:NPWTMI>2.0.ZU;2-Z
Abstract
A 1.8-cm-diam multicusp ion source to be used for focused ion beam applicat ions has been tested for Xe, He, Ne, Ar, and Kr ions. The extractable ion a nd electron currents were measured. The extractable ion current is similar for all these ion species except for Ne+, but the extractable electron curr ent behaves quite differently. The multicusp ion source will be used with a combined extractor-collimator electrode system that can provide a few hund red nA of Xe+ or Kr+ ions. Ion optics computation indicates that these beam s can be further focused with an electrostatic column to a beam spot size o f similar to 100 nm. (C) 2000 American Institute of Physics. [S0034-6748(00 )58402-0].