Uses of high-sensitivity white-light absorption spectroscopy in chemical vapor deposition and plasma processing

Authors
Anderson, LW Goyette, AN Lawler, JE
Citation
Lw. Anderson et al., Uses of high-sensitivity white-light absorption spectroscopy in chemical vapor deposition and plasma processing, ADV ATOM MO, 43, 2000, pp. 295-339
Citations number
46
Categorie Soggetti
Current Book Contents
Journal title
ADVANCES IN ATOMIC, MOLECULAR, AND OPTICAL PHYSICS, VOL 43
ISSN journal
1049250X → ACNP
Volume
43
Year of publication
2000
Pages
295 - 339
Database
ISI
SICI code
1049-250X(2000)43:<295:UOHWAS>2.0.ZU;2-9