Measurements of depth-setting standards, carried out at nine national
metrology laboratories within the framework of EUROMET project No. 301
, are compared. The objects used for this comparison take the form of
chromium-coated silicon substrates with rectangular grooves of 0,1 mm
and 0,01 mm width and nominal depths from 30 nm to 3200 nm. For the ca
libration several stylus instruments, and interference microscopes bas
ed on different measuring principles, were used. The comparison shows
that the participating laboratories are able, in general, to determine
the groove depth with uncertainties ranging from a few nanometres for
a groove of 30 nm nominal depth to some tens of nanometres for a groo
ve of 3200 nm. At 3200 nm the scatter of measurements between the part
icipants is characterized by a standard deviation of 40 nm, a value co
nsidered unsatisfactory for calibrations at a primary level.