In vitro calcification model - Part 1: Apatite formation on segmented polyurethane containing silicone using an alternate soaking process

Citation
T. Karita et al., In vitro calcification model - Part 1: Apatite formation on segmented polyurethane containing silicone using an alternate soaking process, J BIOACT C, 15(1), 2000, pp. 72-84
Citations number
30
Categorie Soggetti
Multidisciplinary
Journal title
JOURNAL OF BIOACTIVE AND COMPATIBLE POLYMERS
ISSN journal
08839115 → ACNP
Volume
15
Issue
1
Year of publication
2000
Pages
72 - 84
Database
ISI
SICI code
0883-9115(200001)15:1<72:IVCM-P>2.0.ZU;2-L
Abstract
The effect of silicone on calcification on polyetherpolyurethane (PU) surfa ces was studied using an alternate soaking process in vitro. The process is based on a wet process of hydroxyapatite formation that involves alternate ly soaking in CaCl2/Tris-HCl (pH 7.4) and Na2HPO4 solutions (pH 7.4) at 37 degrees C. We used K-III and Pellethane(R) 2363 as samples. K-III is a comp lex of PU containing dimethyldiacetoxysilane and methyltriacetoxysilane. Pe llethane(R) 2363 series contain less Si. Si content was assessed by X-ray p hotoelectron spectroscopy (XPS). The gravimetric measurements and scanning electron microscopic observations with energy dispersed X-ray analyzer (EDX ) were performed after specific reaction cycles. Calcified deposits formed on the surface of K-III were 20 mu g/cm(2) after 10 reaction cycles. EDX re sults showed remarkable Ca (K alpha, Kb), P (K alpha), and Si (K alpha) pea ks by the deposits formed on the surface of K-III. On the other hand, no pe aks for Ca of P were observed on the surface of Pellethane(R) after ten rea ction cycles. The reason for calcified deposit formation on PU is not clear . However, it was suggested that Si on the surface of PU is one of the key factors for calcified deposit formation. These results suggest that an alte rnate soaking process could be a useful evaluation method for an accelerate d evaluation of fatigue induced by calcification on polymer substrates.