The paper presents the results of investigation of self-assembled Ge island
s growth on Si (0 0 1) at 700 degrees C and the evolution of islands parame
ters during annealing. Dissolution of Si in islands was revealed front the
Raman scattering and the X-ray diffraction measurements. It was found that
the content of Si in islands increased during annealing. This increase was
shown to result in the changes of island sizes and island shape from "dome"
to "pyramid". (C) 2000 Elsevier Science B.V. All rights reserved.