Improved properties of polycrystalline GaN grown on silica glass substrate

Citation
M. Hiroki et al., Improved properties of polycrystalline GaN grown on silica glass substrate, J CRYST GR, 209(2-3), 2000, pp. 387-391
Citations number
6
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
JOURNAL OF CRYSTAL GROWTH
ISSN journal
00220248 → ACNP
Volume
209
Issue
2-3
Year of publication
2000
Pages
387 - 391
Database
ISI
SICI code
0022-0248(20000201)209:2-3<387:IPOPGG>2.0.ZU;2-9
Abstract
Much improved optical properties are obtained for the polycrystalline GaN l ayers grown on amorphous silica glass substrate by gas source molecular bea m epitaxy using an ion removed electron-cyclotron resonance radical cell. P hotoluminescence (PL) spectrum shows a strong band edge emission with a ful l-width at half-maximum (FWHM) as less as 60 meV at room temperature. 8K PL spectrum has only two sharp peaks at 3.49 eV (FWHM 17 meV) and at 3.44 eV (FWHM 30 meV). X-ray diffraction rocking curve indicates C-axis orientation . Atomic force microscopy image shows a strongly oriented uniform-size grai n structure surface morphology. Clear correlations between the PL propertie s and the crystalline structures (qualities) are observed. (C) 2000 Elsevie r Science B.V. All rights reserved.