Investigation of carbon-doped base materials grown by CBE for Al-free InPHBTs

Citation
Jl. Benchimol et al., Investigation of carbon-doped base materials grown by CBE for Al-free InPHBTs, J CRYST GR, 209(2-3), 2000, pp. 476-480
Citations number
21
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
JOURNAL OF CRYSTAL GROWTH
ISSN journal
00220248 → ACNP
Volume
209
Issue
2-3
Year of publication
2000
Pages
476 - 480
Database
ISI
SICI code
0022-0248(20000201)209:2-3<476:IOCBMG>2.0.ZU;2-Q
Abstract
InGaAs/InP heterojunction bipolar transistors with a carbon-doped base are shown to have lower gain that those with a Be-doped base. In order to keep advantage of the low diffusivity of the carbon dopant, alternative carbon-d oped materials have been tested as the base material. A quaternary InGaAsP alloy with a lower band gap than InGaAs to reduce Auger recombination prove d to be unsatisfactory, because of low doping (<2 x 10(19) cm(-3)) and dram atically lower electron lifetime than in InGaAs. The compositionally graded base proved to be an attractive solution, allowing significantly improved gain in HBTs, and leading to some advantageous side effects, such as higher doping level, constant gain over large current range, and higher frequenci es. (C) 2000 Elsevier Science B.V. All rights reserved.