Realization of high-quality GaAs photovoltaic materials and devices by meta
lorganic molecular beam epitaxy (MOMBE) and chemical beam epitaxy (CBE) wit
h growth rates in excess of 3 mu m/h is demonstrated. Despite high growth r
ates, the optimization of III/V flux-ratio and growth temperatures leads to
a two-dimensional layer-by-layer growth mode characterized by a (2 x 4) RH
EED diagrams and strong intensity oscillations. The not intentionally doped
layers exhibit low background impurity concentrations and good luminescenc
e properties. Both n (Si) and p (Be) doping studies in the range of concent
rations necessary for photovoltaic device generation are reported. Prelimin
ary GaAs (p/n) solar cells fabricated at growth rates in excess of 3 mu m/h
exhibit performances comparable to state of the art and stress the potenti
al of the high growth rate MOMBE/CBE as reduced toxicity alternatives for t
he production of space III-V solar cells. (C) 2000 Elsevier Science B.V. Al
l rights reserved.