Effects of oxygen plasma condition on MBE growth of ZnO

We report growth condition optimizations of ZnO films by plasma-assisted mo lecular beam epitaxy. Effects of oxygen plasma conditions on film quality w ere evaluated by photoluminescence, X-ray characterization and scanning ele ctron microscopy. From the growth experiments on c-plane sapphire and bulk ZnO ( + c, - c) substrates, it was suggested that the surface morphology is strongly related with the growth direction of ZnO parallel to its c-axis, and was found to be controllable by optimization of oxygen plasma condition s. (C) 2000 Elsevier Science B,V. All rights reserved.