Nitrogen-doped ZnO layers were grown on sapphire substrates by radical sour
ce molecular beam epitaxy by simultaneously introducing O-2 and N-2 via a R
F radical source. Reflection high-energy electron diffraction and X-ray dif
fraction measurements revealed that high N-2/O-2 flow ratios induced growth
ta ins into the ZnO layer. A nitrogen-doped ZnO fabricated using a N-2/O-2
flow ratio of 10% was found to have a chemical nitrogen concentration of 1
x 10(19) cm(-3). However, type conversion from n-type to p-type did not oc
cur while large nitrogen incorporation was observed to induce extended defe
cts. (C) 2000 Elsevier Science B.V. All rights reserved.