Nitrogen-induced defects in ZnO : N grown on sapphire substrate by gas source MBE

Citation
K. Iwata et al., Nitrogen-induced defects in ZnO : N grown on sapphire substrate by gas source MBE, J CRYST GR, 209(2-3), 2000, pp. 526-531
Citations number
11
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
JOURNAL OF CRYSTAL GROWTH
ISSN journal
00220248 → ACNP
Volume
209
Issue
2-3
Year of publication
2000
Pages
526 - 531
Database
ISI
SICI code
0022-0248(20000201)209:2-3<526:NDIZ:N>2.0.ZU;2-T
Abstract
Nitrogen-doped ZnO layers were grown on sapphire substrates by radical sour ce molecular beam epitaxy by simultaneously introducing O-2 and N-2 via a R F radical source. Reflection high-energy electron diffraction and X-ray dif fraction measurements revealed that high N-2/O-2 flow ratios induced growth ta ins into the ZnO layer. A nitrogen-doped ZnO fabricated using a N-2/O-2 flow ratio of 10% was found to have a chemical nitrogen concentration of 1 x 10(19) cm(-3). However, type conversion from n-type to p-type did not oc cur while large nitrogen incorporation was observed to induce extended defe cts. (C) 2000 Elsevier Science B.V. All rights reserved.