High-tensile ductility in nanocrystalline copper

Citation
L. Lu et al., High-tensile ductility in nanocrystalline copper, J MATER RES, 15(2), 2000, pp. 270-273
Citations number
15
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF MATERIALS RESEARCH
ISSN journal
08842914 → ACNP
Volume
15
Issue
2
Year of publication
2000
Pages
270 - 273
Database
ISI
SICI code
0884-2914(200002)15:2<270:HDINC>2.0.ZU;2-M
Abstract
In this work we report a high-tensile ductility in a fully dense bulk nanoc rystalline (nc) pure copper sample prepared by electrodeposition. A tensile ductility with an elongation to fracture of 30% was obtained in the ne Cu specimen with an average grain size of 27 nm, which is comparable to that f or the coarse-grained polycrystalline Cu. An enhanced yield stress (119 MPa ) and a depressed strain hardening exponent (0.22) were observed in the nc Cu sample with respect to the conventional polycrystalline Cu. The high-ten sile ductility was attributed to the minimized artifacts in the nc sample, and the grain-boundary sliding deformation mechanism resulted from the nume rous amount small-angle grain boundaries and the low microstrain (dislocati on density).