Epitaxial ZnO films on non-crystalline substrates

First results on a preparation of epitaxial ZnO films on non-crystalline su bstrates are presented. A two-step method is proposed to fabricate the sing le-crystalline ZnO films on non-crystalline substrates (alumina and fused s ilica). To secure the further autoepitaxy, a thin intermediate basis-orient ed textured ZnO layer was deposited by a de magnetron sputtering, as the fi rst step. The epitaxial films prepared by CVD technique on the substrate wi th the buffer layer in the low pressure system feature high structural qual ity and smooth surface while the films prepared onto a clear substrate surf ace were polycrystalline. (C) 1999 Published by Elsevier science S.A. All r ights reserved.