The curing reactions and optimal schedules of three promising flip-chip und
erfill materials under isothermal and nonisothermal treatments are reported
. It is found that curing reactions for three-tested underfill materials ar
e autocatalytic, and the cure rate can be well described by the correspondi
ng model. The activation energy, the rate constants, as well as two reactio
n orders m and n are determined to describe the curing progress. The temper
ature dependence of the cure degree for each heating rate is also investiga
ted. It is found that the extent of reactions at a given temperature is a f
unction of the heating rate. The glass transition temperature for the under
fill UF-LI is determined as a function of cure degree. It is found that the
glass transition temperature increases with the cure time. (C) 2000 Elsevi
er Science Ltd. All rights reserved.