Effect of the diffusion anisotropy on the nucleation and growth of xenon on Cu(110)

Citation
M. Dienwiebel et al., Effect of the diffusion anisotropy on the nucleation and growth of xenon on Cu(110), SURF SCI, 446(1-2), 2000, pp. L113-L119
Citations number
14
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
SURFACE SCIENCE
ISSN journal
00396028 → ACNP
Volume
446
Issue
1-2
Year of publication
2000
Pages
L113 - L119
Database
ISI
SICI code
0039-6028(20000201)446:1-2<L113:EOTDAO>2.0.ZU;2-A
Abstract
The growth of Xe on the corrugated Cu(110) surface has been investigated us ing scanning tunneling microscopy. It is shown that the diffusion anisotrop y call lead to the stabilization of energetically unfavored structures and growth modes in two dimensions. In the present case the nucleation and grow th occurs at [001]-oriented steps at low surface temperature (13 K) whereas at high higher temperatures (40 K) an almost exclusive decoration of the [ 110] step edges takes place. These results are explained by interaction cal culations and Monte Carlo simulations, (C) 2000 Elsevier Science B,V. All r ights reserved.