Effect of hydrogen etching on 6H SiC surface morphology studied by reflection high-energy positron diffraction and atomic force microscopy

Citation
A. Kawasuso et al., Effect of hydrogen etching on 6H SiC surface morphology studied by reflection high-energy positron diffraction and atomic force microscopy, APPL PHYS L, 76(9), 2000, pp. 1119-1121
Citations number
13
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
76
Issue
9
Year of publication
2000
Pages
1119 - 1121
Database
ISI
SICI code
0003-6951(20000228)76:9<1119:EOHEO6>2.0.ZU;2-1
Abstract
Hydrogen-etched 6H SiC (0001) surfaces have been studied by reflection high -energy positron diffraction and atomic force microscopy. It was found that residual damage on the surfaces were effectively removed by the hydrogen e tching as compared to the HF etching after the oxidation. The hydrogen-etch ed surfaces were atomically flat. After the oxidation following the hydroge n etching, the surface roughness was found to increase and an anomalous dip structure appeared in the rocking curve of the reflection high-energy posi tron diffraction. (C) 2000 American Institute of Physics. [S0003-6951(00)02 209-9].