Multilayered gated lateral quantum dot devices

Citation
Ct. Liang et al., Multilayered gated lateral quantum dot devices, APPL PHYS L, 76(9), 2000, pp. 1134-1136
Citations number
15
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
76
Issue
9
Year of publication
2000
Pages
1134 - 1136
Database
ISI
SICI code
0003-6951(20000228)76:9<1134:MGLQDD>2.0.ZU;2-3
Abstract
We describe a detailed device fabrication technique for the formation of a lateral quantum dot using a multilayered gated design. In our versatile sys tem, a quantum dot is electrostatically defined by a split gate and two ove rlaying finger gates which introduce entrance and exit barriers to the dot. Periodic and continuous conductance oscillations arising from Coulomb char ging effects are clearly observed in the transport properties at low temper atures. (C) 2000 American Institute of Physics. [S0003-6951(00)00609-4].