Ultraviolet cavity ring-down spectroscopy of free radicals in etching plasmas

Many reactive species of interest in technological plasmas absorb light in the UV spectral region (200-300 nm). Measurement of these weak absorbances (typically 10(-2)-10(-4) for a single pass) allows us to determine their ab solute concentration. Low-resolution absorption spectra of these systems ha ve previously been obtained by broad-band absorption spectroscopy. Here we present spectra obtained using laser cavity ring-down spectroscopy, which h as much higher spectral resolution, and potentially higher sensitivity. Spe ctra were obtained for CF, CF2, AlF and SiF2 radicals in capacitively-coupl ed radio-frequency plasmas in fluorocarbon gases. This technique offers the possibility of real-time (1 s) absolute concentration measurements during wafer processing. (C) 2000 Elsevier Science B.V. All rights reserved.