We have prepared hexagonally arranged pore arrays with large interpore dist
ance (200-460 nm) by using two kinds of techniques: a self-organization pro
cess and a prepattern guided anodization on aluminum. The self-organized po
re arrays were produced by anodizing aluminum in an aqueous phosphoric acid
solution (H3PO4:CH3OH:H2O = 1:10.89), and show a polycrystalline, i.e., po
ly-domain, feature. Within each domain of several micrometers, the arrays a
re hexagonally arranged with an interpore distance of 460 nm, while the dom
ains are oriented randomly in plane. A monocrystalline pore array structure
with variable interpore distance was prepared based on electron-beam litho
graphy and a subsequent anodization in oxalic acid solution. With a well-de
signed set of anodization parameters, the prepattern can act as the initiat
ion points and guide the pore growth in the anodic film. Very high aspect r
atios (similar to 500) can be achieved. (C) 2000 The Electrochemical Societ
y. S1099-0062(99)08-058-X. All rights reserved.