Photoelectrochemical determination of the flatband potential of boron-doped diamond

Citation
Yv. Pleskov et al., Photoelectrochemical determination of the flatband potential of boron-doped diamond, EL SOLID ST, 3(3), 2000, pp. 141-143
Citations number
12
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
ELECTROCHEMICAL AND SOLID STATE LETTERS
ISSN journal
10990062 → ACNP
Volume
3
Issue
3
Year of publication
2000
Pages
141 - 143
Database
ISI
SICI code
1099-0062(200003)3:3<141:PDOTFP>2.0.ZU;2-I
Abstract
Flatband potentials of boron-doped polycrystalline and single crystal chemi cal vapor deposition and high-temperature, high-pressure diamond electrodes were estimated by three photoelectrochemical methods (i) as the photocurre nt onset potential, (ii) from the dependence of photopotential on the light intensity, and (iii) by extrapolating the potential dependence of the phot ocurrent squared. The potentialities of these methods are discussed, as app lied to diamond electrodes. (C) 2000 The Electrochemical Society. S1099-006 2(99)10-052-X. All rights reserved.