Exposure of Fucus spiralis germlings to precise copper concentrations (0 to
844 nM Cu2+) in chemically defined medium demonstrated a relationship betw
een urltrastructural changes and growth retardation with increasing copper
concentration. Electron-translucent vesicles, present in ova, which normall
y disappear after fertilization, accumulated in germlings exposed to Cu2+ a
bove 10.6 nM, suggesting that copper may inhibit a metabolic pathway involv
ed in cell wall formation which is initiated by fertilization No membrane d
amage was observed during the exposure period. During a post-exposure perio
d in copper-free medium, recovery occurred (rhizoid extension, apical hair
formation) in germlings previously exposed to concentrations below 106 nM C
u2+ and electron-translucent vesicles became granular and disappeared. It i
s proposed that the electron-translucent vesicles contain a cell wall precu
rsor and that copper inhibits its incorporation into the cell wall, prevent
ing growth and development of the zygote.