Quasi-tem analysis of a shielded microstrip line of elliptic cross-sectionwith finite metallization thickness penetrating into the substrate by the finite difference method

Authors
Wang, Q Liu, CQ Li, Y
Citation
Q. Wang et al., Quasi-tem analysis of a shielded microstrip line of elliptic cross-sectionwith finite metallization thickness penetrating into the substrate by the finite difference method, INT J INFRA, 21(1), 2000, pp. 91-100
Citations number
19
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
INTERNATIONAL JOURNAL OF INFRARED AND MILLIMETER WAVES
ISSN journal
01959271 → ACNP
Volume
21
Issue
1
Year of publication
2000
Pages
91 - 100
Database
ISI
SICI code
0195-9271(200001)21:1<91:QAOASM>2.0.ZU;2-H
Abstract
A shielded microstripline(MSL) of elliptic cross-section with finite metall ization thickness penetrating into the substrate is presented. The quasi-st atic characteristics of this kind of MSL are studied with finit difference method(FDM),The effect of metal cross-section shape and metal penetrating d epth is also studied.