Vanadium carbides were prepared via the temperature-programmed reaction of
V2O5 with a CH4/H-2 mixture and evaluated for the dehydrogenation of n-buta
ne. Thermogravimetric analysis coupled with X-ray diffraction indicated tha
t the solid-state reaction proceeded by the following sequential reaction:
V2O5 --> V2O3 --> V8C7. The space velocity and heating rates had insignific
ant effects on the surface areas; however, the use of a high-temperature H-
2 post-treatment caused a reduction in the surface area and carbon content.
Temperature-programmed reduction results indicated that oxygen was more st
rongly bound to the substoichiometric vanadium carbide than to the stoichio
metric material. The results were also consistent with the presence of an o
xycarbide near surfaces of the passivated vanadium carbides. The passivated
vanadium carbides were sufficiently activated by reduction in H-2 at 500 d
egrees C for 3 h. Oxygen chemisorptive uptakes on the reduced vanadium carb
ides corresponded to an O/V ratio of 0.28. This oxygen-to-metal ratio is ha
lf that measured for the vanadium nitrides, suggesting that some excess car
bon may have been present on surfaces of the carbides. The butane dehydroge
nation turnover frequency for the vanadium carbide catalyst was 10(-3) s(-1
) at 450 degrees C. The corresponding turnover frequency for a Pt-Sn/Al2O3
catalyst was 6.3 x 10(-2) s(-1). Near-edge X-ray absorption fine structure
spectroscopy indicated that the vanadium carbide and nitride catalysts were
partially ionic, with charge transfer being from vanadium to carbon or nit
rogen. This degree of ionic bonding distinguishes the vanadium compounds fr
om other carbides and nitrides and could partly explain their high dehydrog
enation selectivities. Similarities between catalytic properties of the van
adium carbides and nitrides were likely a consequence of their similar elec
tronic structures. The p-projected density of unoccupied states near the ca
rbon and nitrogen K-edges nearly identical. (C) 2000 Academic Press.