Ultraviolet light enhancement of Ta2O5 dry etch rates

Authors
Lee, KP Cho, H Singh, RK Pearton, SJ Hobbs, C Tobin, P
Citation
Kp. Lee et al., Ultraviolet light enhancement of Ta2O5 dry etch rates, J VAC SCI B, 18(1), 2000, pp. 293-295
Citations number
25
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
ISSN journal
10711023 → ACNP
Volume
18
Issue
1
Year of publication
2000
Pages
293 - 295
Database
ISI
SICI code
1071-1023(200001/02)18:1<293:ULEOTD>2.0.ZU;2-N