Secondary ion mass spectroscopic analysis of copper migration at the copper/polyimide interface

Citation
N. Miki et al., Secondary ion mass spectroscopic analysis of copper migration at the copper/polyimide interface, J VAC SCI B, 18(1), 2000, pp. 313-316
Citations number
11
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
ISSN journal
10711023 → ACNP
Volume
18
Issue
1
Year of publication
2000
Pages
313 - 316
Database
ISI
SICI code
1071-1023(200001/02)18:1<313:SIMSAO>2.0.ZU;2-N
Abstract
Dynamic secondary ion mass spectroscopy (D-SIMS) was applied to analyze the copper (Cu) migration behavior at the interface between polyimide (PI) and Cu. The (PI/Cu) bilayer specimen was prepared by curing polyamic acid (PAA ) coated on the Cu substrate. It was found that the Cu deeply migrates into the PI phase across its interface. On the contrary, the Cu migration was n ot detected at all when the (PI/Cu) bilayer was built up by the vapor depos ition of Cu onto the PI film. These results clearly indicate that the Cu mi gration behavior is strongly dependent on how the bilayer is prepared. (C) 2000 American Vacuum Society.[S0734-211X(00)09301-X].