Citation
S. Pau et al., Wavelength-independent optical lithography, J VAC SCI B, 18(1), 2000, pp. 317-320
Citations number
3
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
ISSN journal
10711023
→ ACNP
Volume
18
Issue
1
Year of publication
2000
Pages
317 - 320
Database
ISI
SICI code
1071-1023(200001/02)18:1<317:WOL>2.0.ZU;2-C
Abstract
We propose and demonstrate a multiple exposure lithographic technique with
resolution limited by processing and not by exposure wavelength. We impleme
nt this technique using binary masks and conventional illumination at lambd
a(e) = 248 nm and show that various types of patterns of dimension up to la
mbda(e)/10 can be printed. (C) 2000 American Vacuum Society. [S0734-211X(00
)03001-8].