Microelectronics and nanometer structures processing, measurement, and phenomena - Papers from the Fifth International Workshop on the Measurement, Characterization, and Modeling of Ultra-shallow Doping Profiles in Semiconductors - 28-31 March 1999 - Research Triangle Park North Carolina - Preface

Authors
Larson, L
Citation
L. Larson, Microelectronics and nanometer structures processing, measurement, and phenomena - Papers from the Fifth International Workshop on the Measurement, Characterization, and Modeling of Ultra-shallow Doping Profiles in Semiconductors - 28-31 March 1999 - Research Triangle Park North Carolina - Preface, J VAC SCI B, 18(1), 2000, pp. 337-337
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
ISSN journal
10711023 → ACNP
Volume
18
Issue
1
Year of publication
2000
Pages
337 - 337
Database
ISI
SICI code
1071-1023(200001/02)18:1<337:MANSPM>2.0.ZU;2-X