The availability of very sharp, wear-proof, electrically conductive probes
is one crucial issue for conductive atomic force microscopy (AFM) technique
s such as scanning capacitance microscopy; scanning spreading resistance mi
croscopy, and nanopotentiometry. The purpose of this systematic study is to
give an overview of the existing probes and to evaluate their performance
for the electrical techniques with emphasis on applications on Si at high c
ontact forces. The suitability of the characterized probes has been demonst
rated by applying Conductive AEM techniques to test structures and state-of
-the-art semiconductor devices. Two classes. of probes were examined geomet
rically and electrically: Si sensors with a conductive coating and integrat
ed pyramidal tips made of metal or diamond. Structural information about th
e conductive materials was obtained by electron microscopy and other analyt
ical tools. Swift and nondestructive procedures to characterize the geometr
ical and electrical properties of the probes prior to the actual AFM experi
ment have been developed. Existing contact models have been used to explain
variations in the electrical performance of the conductive probes. (C) 200
0 American Vacuum Society. [S0734-211X(00)01901-6].