Materials theory based modeling of wide band gap semiconductors: from basic properties to devices

Citation
Kf. Brennan et al., Materials theory based modeling of wide band gap semiconductors: from basic properties to devices, SOL ST ELEC, 44(2), 2000, pp. 195-204
Citations number
28
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Eletrical & Eletronics Engineeing
Journal title
SOLID-STATE ELECTRONICS
ISSN journal
00381101 → ACNP
Volume
44
Issue
2
Year of publication
2000
Pages
195 - 204
Database
ISI
SICI code
0038-1101(200002)44:2<195:MTBMOW>2.0.ZU;2-1
Abstract
In this paper we present a general methodology, materials theory based mode ling, for predicting device performance in technologically immature materia ls that can proceed relatively independently of experiment. The models inco rporated within this general approach extend from a fundamental physics bas ed, microscopic analysis to macroscopic, engineering based device models. U sing this scheme, we have investigated the transport and breakdown properti es of several emerging wide band gap semiconductor materials, i.e. GaN, InN , 3C-SiC, and 4H-SIC. The carrier drift velocities, mobilities, and impact ionization coefficients for these materials can be predicted using the mate rials theory based modeling method. Using these results, device level simul ations can then be made. Here we report Monte Carlo and selfconsistent char ge control modeling of GaN based devices. Comparison to experimental measur ements is made when possible. Good agreement between the selfconsistent cha rge control model calculations and experiment is obtained. Some of the issu es pertinent to heterostructure bipolar transistor modeling of GaN are disc ussed. (C) 2000 Elsevier Science Ltd. All rights reserved.