GaN/SiC heterojunction bipolar transistors

Citation
Wj. Schaff et al., GaN/SiC heterojunction bipolar transistors, SOL ST ELEC, 44(2), 2000, pp. 259-264
Citations number
24
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Eletrical & Eletronics Engineeing
Journal title
SOLID-STATE ELECTRONICS
ISSN journal
00381101 → ACNP
Volume
44
Issue
2
Year of publication
2000
Pages
259 - 264
Database
ISI
SICI code
0038-1101(200002)44:2<259:GHBT>2.0.ZU;2-1
Abstract
Heterojunction bipolar transistors made from GaN emitter and SIC base and c ollector regions are desired for high power, broad bandwidth microwave ampl ifiers. Their most critical element is the quality of the base-emitter junc tion. High efficiency emitter injection requires an interface between these lattice-mismatched materials, which does not produce significant leakage c urrent due to defects, in addition to having desirable band-offsets. An imp ortant factor in understanding GaN/SiC heterojunction rectification is acco unting for spontaneous polarization and piezoelectric effects. Theory is pr esented which shows that a strained GaN/SiC junction will form a 2D hole ga s in the base, while an unstrained junction will form a 2D-electron gas. Ex tending the critical thickness of GaN grown on SiC using patterned area gro wth might permit improved interface properties. (C) 2000 Elsevier Science L td. All rights reserved.