NANOSCALE CHARACTERIZATION OF SEMICONDUCTOR SURFACES BY SPATIALLY-RESOLVED PHOTOCURRENT MEASUREMENTS

Citation
R. Hiesgen et D. Meissner, NANOSCALE CHARACTERIZATION OF SEMICONDUCTOR SURFACES BY SPATIALLY-RESOLVED PHOTOCURRENT MEASUREMENTS, Fresenius' journal of analytical chemistry, 358(1-2), 1997, pp. 54-58
Citations number
19
Categorie Soggetti
Chemistry Analytical
ISSN journal
09370633
Volume
358
Issue
1-2
Year of publication
1997
Pages
54 - 58
Database
ISI
SICI code
0937-0633(1997)358:1-2<54:NCOSSB>2.0.ZU;2-B
Abstract
A method based on scanning tunneling microscopy has been developed to measure spatially resolved primary photocurrents together with the top ographical image. As model semiconductors n- and p-type WSe2-monocryst als have been used. The system consisting of metal tip, gap and semico nductor sample behaves as a classical metal-insulator-semiconductor (M IS) solar cell. The resolution achieved in the photocurrent image is a t least 1 nm. In order to demonstrate the technique, the sur-faces of clean n- and p-type WSe2 samples have been investigated. The method ha s been extended to analyze metal modified semiconductor surfaces and s ome of these results are shown here.