Microstructure and composition of MgF2 optical coatings grown on Si substrate by PVD and IBS processes

Citation
D. Jacob et al., Microstructure and composition of MgF2 optical coatings grown on Si substrate by PVD and IBS processes, THIN SOL FI, 360(1-2), 2000, pp. 133-138
Citations number
18
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
THIN SOLID FILMS
ISSN journal
00406090 → ACNP
Volume
360
Issue
1-2
Year of publication
2000
Pages
133 - 138
Database
ISI
SICI code
0040-6090(20000201)360:1-2<133:MACOMO>2.0.ZU;2-Q
Abstract
MgF2 is a current material for the optical applications in the UV and deep UV range. Nevertheless, modern applications still require improvement of th e optical and structural quality of the deposited layers. In the present wo rk, the composition and microstructure of MgF2 single layers grown on Si [1 00] substrate by physical vapour deposition (PVD) and ion beam sputtering ( IBS) processes, were analyzed and compared. Experiments were carried out us ing X-ray photoelectron spectroscopy (XPS) in depth profile, grazing angle X-ray diffraction (XRD) and transmission electron microscopy (TEM). Both la yers exhibited a good stoichiometry and a low level of contamination. The s ample grown by IBS revealed more homogeneous and regular columnar microstru cture than the other one. (C) 2000 Elsevier Science S.A. All rights reserve d.