SIMS-ANALYSIS ON B, N, AND C CONTAINING LAYERS

B, N, and C containing layers produced by the ''Chemical Vapour Deposi tion'' (CVD) method were investigated by SIMS in respect of their elem ental composition and impurities. The atomic B/N ratios found are betw een 1:0.15 and 1:0.46 referred to an h-BN powder (B/N = 1:1 supposed) as reference material. The carbon content was 5 to 12 at-%, additional H and O impurities were detected. Dependencies of the film compositio n on process parameters and the problems occurring during SIMS measure ments of such layers are discussed.