Rj. Schirach et al., CHARACTERIZATION OF CRYSTAL FACES OF POLYCRYSTALLINE HFCVD DIAMOND FILMS BY STM STS/, Fresenius' journal of analytical chemistry, 358(1-2), 1997, pp. 335-338
Among the numerous techniques available for the characterization of di
amond films scanning tunnelling microscopy (STM) in combination with s
pectroscopy (STS) provides information about the morphology and electr
onic surface properties down to the atomic scale. Here results of STM/
STS obtained on diamond films are reported. 0.5 to 1.25 mu m thick fil
ms have been grown on silicon substrates by hot filament chemical vapo
ur deposition (HFCVD) by variable CH4/H-2 mixtures in the range of 0.5
% to 3% CH4. Morphological features of diamond crystallites were studi
ed in detail by STM. A distinct increase of the surface roughness of (
111) crystal faces with increasing CH4 concentration (from 0.5% to 3%)
was found. For a CH4 concentration of 3% (100) faces were smoother th
an (111) faces. STS revealed significant differences in the tunneling
current/voltage (I/V)-characteristics between (111) and (100) crystal
surfaces. For (111) surfaces distinct changes in the I/V-characteristi
cs depending on the CH4 concentration were observed: The I/V-character
istics change and the conductivity increases raising the CH4 concentra
tion from 0.5% to 3%. This effect is explained with increasing formati
on of non-diamond carbon (NDC) on (111) surfaces for higher CH4 concen
trations. Thus NDC is also responsible for the enhanced surface roughn
ess observed on (111) surfaces with increasing CH4 concentrations.