Submicron-resolution ablation with a KrF excimer laser beam patterned witha projection lens

A mask projection system working with KrF laser radiation is described. Thi s system produces microscopic laser beams able to pattern gratings on the s urface of various materials in the micrometer range by direct etching. Mode ls have been developed to simulate the beam intensity profile on the sample . Various polymers have been irradiated, and their experimental profiles ar e compared with theoretical ones. Different ablation behaviors have been ev idenced. Interesting consequences of thermal effects at this submicron scal e are reported.