Characterization of fast electron emission in UV laser ablation of metallic targets

Citation
S. Amoruso et al., Characterization of fast electron emission in UV laser ablation of metallic targets, APPL PHYS A, 69, 1999, pp. S483-S486
Citations number
12
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING
ISSN journal
09478396 → ACNP
Volume
69
Year of publication
1999
Supplement
S
Pages
S483 - S486
Database
ISI
SICI code
0947-8396(199912)69:<S483:COFEEI>2.0.ZU;2-A
Abstract
We report on prompt emission of fast electrons occurring during nanosecond excimer laser ablation of aluminum targets in vacuum. We have measured both the kinetic energy distribution and the energy-integrated time-of-flight d istribution of these electrons, in the fluence range 1-10 Jcm(-2). Moreover , at higher laser fluences, the yield of prompt electrons and the most prob able kinetic energy as a function of the laser pulse fluence have also been obtained by charge collection and time-of-flight measurements. The experim ental data show that the prompt electrons are produced during the laser pul se as a consequence of two-photon processes, and that space-charge effects influence the photoemitted electron kinetic energy leading to prompt electr ons with most probable kinetic energies up to approximate to 15 eV, in the investigated fluence range.