Ablated gratings on borosilicate glass by 193-nm excimer laser radiation

Relief gratings of 500-nm period have been fabricated on Er/Yb-doped borosi licate glass substrates by laser ablation through the use of an excimer las er, at a wavelength of 193-nm, and a modified Mach-Zehnder interferometer. The grating fabrication process has been quantified by the use of diffracti on efficiency measurements and atomic force microscope microscans and is re lated to the incident energy density.