Comparison of Pt/TiO2 nanocomposite films prepared by sputtering and pulsed laser deposition

Citation
T. Sasaki et al., Comparison of Pt/TiO2 nanocomposite films prepared by sputtering and pulsed laser deposition, APPL PHYS A, 69, 1999, pp. S771-S774
Citations number
17
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING
ISSN journal
09478396 → ACNP
Volume
69
Year of publication
1999
Supplement
S
Pages
S771 - S774
Database
ISI
SICI code
0947-8396(199912)69:<S771:COPNFP>2.0.ZU;2-R
Abstract
Pt/TiO2 nanocomposite films were prepared by sputtering and pulsed laser de position (PLD). The Pt/Ti atomic ratios in the films deposited by the PLD w ere smaller than those in the ablation targets and those in the films prepa red by sputtering. At low Pt concentration, Pt is deposited as PtO2 in the films prepared by sputtering, whereas metallic Pt is deposited in the films prepared by PLD. The Pt nanoparticle size in the as-deposited Pt/TiO2 nano composite films prepared by PLD was about 30 nm, which is quite large compa red to the 1-2-nm size in the sputter-deposited films. Pt nanoparticles wer e produced in the growth processes via surface diffusion, which can be refl ected by the kinetic energy of the chemical species spread from the target. It can be inferred from the optical measurements of heated Pt/TiO2 nanocom posite films that new energy levels are produced in the band gap of TiO2 by the homogeneous dispersion of Pt nanoparticles in the TiO2 matrix.