Off-axis pulsed laser deposition system for epitaxial oxide growth on substrates up to 2 inches in diameter

Citation
M. Siegert et al., Off-axis pulsed laser deposition system for epitaxial oxide growth on substrates up to 2 inches in diameter, APPL PHYS A, 69, 1999, pp. S779-S781
Citations number
14
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING
ISSN journal
09478396 → ACNP
Volume
69
Year of publication
1999
Supplement
S
Pages
S779 - S781
Database
ISI
SICI code
0947-8396(199912)69:<S779:OPLDSF>2.0.ZU;2-I
Abstract
A novel off-axis pulsed-laser deposition (PLD) system for ferroelectric oxi de thin films has been developed. The substrates are mounted "upside-down" and are rotating. The maximum substrate size is 2 inches in diameter. The o ptical and structural properties of the grown BaTiO3 films are compared to the films produced by an on-axis PLD system. The stoichiometry and thicknes s were checked with Rutherford backscattering spectrometry (RBS). The cryst alline quality and orientation were investigated with X-ray diffraction (XR D) and Rutherford backscattering spectrometry in channeling configuration ( RBS/C). Using atomic force microscopy, the rms surface roughness was measur ed. The BaTiO3 films grown on MgO form a planar optical waveguide. The opti cal losses and the refractive indices of these waveguides were determined w ith a prism coupling setup. Films grown on Id x 10 mm(2) MgO (100) substrates in on-axis geometry show optical waveguide losses less than 3 dB/cm.