DETERMINATION OF INTERFACE COMPOSITION IN III-V HETEROJUNCTION DEVICES (HT AND RTD) WITH ATOMIC-RESOLUTION USING STEM TECHNIQUES

Citation
H. Lakner et al., DETERMINATION OF INTERFACE COMPOSITION IN III-V HETEROJUNCTION DEVICES (HT AND RTD) WITH ATOMIC-RESOLUTION USING STEM TECHNIQUES, Materials science & engineering. B, Solid-state materials for advanced technology, 44(1-3), 1997, pp. 52-56
Citations number
14
Categorie Soggetti
Material Science","Physics, Condensed Matter
ISSN journal
09215107
Volume
44
Issue
1-3
Year of publication
1997
Pages
52 - 56
Database
ISI
SICI code
0921-5107(1997)44:1-3<52:DOICII>2.0.ZU;2-D
Abstract
In this work, we will present the determination of chemical compositio n across heterointerfaces in the layer stacks of devices such as heter ojunction bipolar transistors (HBT) and resonant tunneling diodes (RTD ) by scanning transmission electron microscopy (STEM). We used STEM-ba sed atomic number (Z) contrast imaging in order to analyze interface a bruptness in HBT and RTD structures qualitatively with monolayer spati al resolution. Electron energy-loss spectroscopy (EELS) was used for t he quantitative chemical analysis of individual ultrathin layers such as RTD barriers. The obtained structural data can be used to improve a nd refine device modeling and design, e.g., composition profiles can b e converted into band structures or barrier widths and exact barrier s hapes in RTDs can be measured directly. Examples for correlations betw een structural data and device properties will be given for InP-based HBT and RTD structures. (C) 1997 Published by Elsevier Science S.A.