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New modes of scanning force microscopy as related to semiconductor res
earch are introduced. These cover quantitative three dimensional metro
logy, local determination of sample voltages and the evaluation of ele
ctrical and thermal features. All of these modes can be operated with
nanometer resolution in principle and allow a comprehensive analysis o
f the material or device under test without the need for extensive sam
ple preparation. (C) 1997 Elsevier Science S.A.