PREPARATION AND TEST OF SPECIAL SURFACES FOR EPI-READY INP WAFERS

Citation
B. Molinas et al., PREPARATION AND TEST OF SPECIAL SURFACES FOR EPI-READY INP WAFERS, Materials science & engineering. B, Solid-state materials for advanced technology, 44(1-3), 1997, pp. 213-216
Citations number
5
Categorie Soggetti
Material Science","Physics, Condensed Matter
ISSN journal
09215107
Volume
44
Issue
1-3
Year of publication
1997
Pages
213 - 216
Database
ISI
SICI code
0921-5107(1997)44:1-3<213:PATOSS>2.0.ZU;2-T
Abstract
The results of the development of two different technologies for the p reparation of special surfaces for ready-to-use ('epi-ready') InP wafe rs are presented. The epi-ready stale was studied by means of X-ray ph otoelectron spectroscopy. The quality of the substrates stored for 4-1 2 months was tested by growing an epilayer by metal-organic vapor phas e epitaxy and by characterizing it with high-resolution X-ray diffract ion and photoluminescence techniques. Evidence that one of our technol ogies could be adopted industrially is given. (C) 1997 Elsevier Scienc e S.A.