J. Horn et al., SCANNING-TUNNELING-MICROSCOPY CHARACTERIZATION OF METALORGANIC CHEMICAL-VAPOR-DEPOSITION GROWN GAN, Materials science & engineering. B, Solid-state materials for advanced technology, 44(1-3), 1997, pp. 414-418
GaN films were grown by metalorganic chemical vapor deposition (MOCVD)
on (0001) c-sapphire substrates and their scanning tunneling microsco
py (STM) characteristics are reported for the first time. X-Ray charac
terization and Hall measurements revealed a full-width-half-maximum (F
WHM) value of 288 arcsec and background doping reduction accompanied w
ith electron mobility enhancement as the growth temperature increased.
STM topography revealed island formations on the growth surface the s
ize of which increased again with growth temperature in a manner consi
stent with the trends of improved electrical characteristics. STM stim
ulated luminescence showed no significant photon emission in the tunne
ling mode but moderate value signals in the field-emission mode, where
the intensity increased with tip voltage. Finally, scanning tunneling
spectroscopy allowed bandgap estimation at 3.5 eV and suggested local
ized band-bending fluctuations across the surface. (C) 1997 Published
by Elsevier Science S.A.